Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM https://www.businesswire.com/news/home/20220802005747/en/Inpria-Co-Developing-Metal-Oxide-Resist-with-SK-hynix-to-Reduce-Complexity-of-Patterning-for-Next-Generation-DRAM tgregoryAugust 2, 2022In the News
JSR Closes Deal to Acquire EUV Pioneer Inpria Corporation https://www.businesswire.com/news/home/20211111005734/en/JSR-Closes-Deal-to-Acquire-EUV-Pioneer-Inpria-Corporation sharonNovember 8, 2021In the News
JSR Agrees to Acquire EUV Pioneer Inpria Corporation https://www.businesswire.com/news/home/20210917005084/en/JSR-Agrees-to-Acquire-EUV-Pioneer-Inpria-Corporation sharonSeptember 17, 2021In the News
Samsung to Diversify Photoresist (PR) for EUV… Seeking to Apply U.S. Inpria’s PR https://www.imec-int.com/en/press/imec-pushes-single-exposure-patterning-capability-033na-euvl-its-extreme-limits sharonJuly 27, 2021In the News
Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits https://www.imec-int.com/en/press/imec-pushes-single-exposure-patterning-capability-033na-euvl-its-extreme-limits sharonFebruary 23, 2021In the News
Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography https://www.imec-int.com/en/press/imec-demonstrates-20nm-pitch-linespace-resist-imaging-high-na-euv-interference-lithography sharonFebruary 21, 2021In the News
인프리아, EUV 무기물 PR 생산량 2배 ‘급성장’ http://www.thelec.kr/news/articleView.html?idxno=8309 sharonOctober 21, 2020In the News
[테크위크 2020 LIVE]인프리아·에스앤에스텍, EUV 소재 ‘퍼스트무버’ 포부 https://www.etnews.com/20200917000127 sharonSeptember 23, 2020In the News
Corvallis startup Inpria lands $31 million to help build the next generation of computer chip https://www.oregonlive.com/silicon-forest/2020/02/corvallis-startup-inpria-lands-31-million-to-help-build-the-next-generation-of-computer-chip.html sharonFebruary 22, 2020In the News
Corvallis semiconductor startup snags $31M from industry heavyweights https://www.bizjournals.com/portland/news/2020/02/20/corvallis-semiconductor-startup-snags-31m-from.html sharonFebruary 22, 2020In the News
ASML informs shareholders, other investors and analysts about the company’s strategy outlook on EUV and other market trends https://www.asml.com/asml/show.do?ctx=51001&rid=51002 sharonDecember 13, 2016In the News
ASML Invests $1.9B in Next-Gen EUV http://www.eetimes.com/document.asp?doc_id=1330781 sharonDecember 13, 2016In the News
Inside EUV Resists: Inpria CEO talks about EUV resist challenges http://semiengineering.com/inside-euv-resists/ sharonDecember 13, 2016In the News
Leading Chipmakers Eye EUV Lithography to Save Moore’s Law http://spectrum.ieee.org/semiconductors/devices/leading-chipmakers-eye-euv-lithography-to-save-moores-law sharonNovember 1, 2016In the News
Bringing new chemistry to solve a chip-making problem http://cen.acs.org/articles/94/i43/Inpria.html sharonNovember 1, 2016In the News
Is EUV Making Progress? http://semiengineering.com/is-euv-making-progress/ sharonApril 17, 2016In the News
EUV Becomes an Answer Instead of a Question http://www.eejournal.com/archives/articles/20160328-euv sharonMarch 28, 2016In the News
EUV Resists Move Forward http://semiengineering.com/euv-resists-move-forward/ sharonMarch 23, 2016In the News
Multi-Beam Market Heats Up http://semiengineering.com/multi-beam-market-heats-up/ sharonMarch 17, 2016In the News
EUV Resists and Stochastic Processes http://semimd.com/blog/2016/03/04/euv-resists-and-stochastic-processes/ sharonMarch 4, 2016In the News
EUV Lithography’s Prospects Are Brightening http://spectrum.ieee.org/tech-talk/semiconductors/devices/euv-lithography-is-brightening-up sharonMarch 2, 2016In the News
OSU spinout lands 2 more high-flying investors http://www.bizjournals.com/portland/blog/techflash/2016/03/osu-spinout-lands-2-more-high-flying-investors.html sharonMarch 1, 2016In the News
Intel, Samsung and others invest another $10 million in Corvallis chip startup pushing the edges of chip technology http://www.oregonlive.com/silicon-forest/index.ssf/2016/03/intel_samsung_and_others_inves.html sharonMarch 1, 2016In the News
What’s the Next-Gen Litho Tech? Maybe All of Them http://semimd.com/blog/2016/02/25/whats-the-next-gen-litho-tech-maybe-all-of-them/ sharonFebruary 25, 2016In the News
Imec, Inpria and TEL demonstrate integrated fab process for metal-oxide EUV photoresist http://www2.imec.be/be_en/press/imec-news/imec-inpria-non-car-euv-lithography-resist.html sharonFebruary 22, 2016In the News
The Business of the Impossible: ASML’s EUV Lithography Tools Push the Boundaries of Invisible http://eejournal.com/archives/articles/20160113-asml sharonJanuary 13, 2016In the News
What’s Really Causing Line-Edge Roughness? http://semiengineering.com/resist-roughness-is-not-just-because-of-photons/ sharonNovember 19, 2015In the News
VCs still investing in semiconductor technology, but need strategic partners and capital efficiency http://electroiq.com/blog/2014/07/vcs-still-investing-in-semiconductor-technology-but-need-strategic-partners-in-capital-and-efficiency/ sharonJuly 14, 2014In the News
Inpria raises another $1.5 million for new semiconductor production technology http://www.oregonlive.com/silicon-forest/index.ssf/2014/06/inpria_raises_another_15_milli.html sharonJune 23, 2014In the News
Metal Oxide Photoresists Lower Roughness http://www.eejournal.com/blog/metal-oxide-resists-lower-roughness/ sharonApril 8, 2014In the News
Corvallis semiconductor materials startup Inpria raises $7.3 million from Samsung, Intel http://www.oregonlive.com/silicon-forest/index.ssf/2014/02/corvallis_semiconductor_equipm.html sharonFebruary 20, 2014In the News
Why Intel, Applied Materials are banking on a Corvallis startup http://www.bizjournals.com/portland/morning_call/2014/02/why-corvallis-may-be-critical-to-the.html sharonFebruary 20, 2014In the News