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Inpria Corporation is a pioneer in extending semiconductor lithography with inorganic photoresists for nanoscale patterning. Inpria’s patented photo-condensed molecular oxides offer customers the unique ability to deposit – directly from solution – atomically smooth, intrinsically dense, and directly photopatternable metal oxide films, enabling advanced performance with simplified processing.
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2001 NW Monroe Avenue, Suite 203, Corvallis, OR 97330
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Recent Funding
Advanced Materials Developer Inpria Raises $1.45M from Oregon Angel Fund

6/19/2014 – Inpria Corporation receives additional equity investment and commitments totaling $1.45 million. Download the release (PDF)

Samsung, Intel Capital and Applied Materials Fund Inpria to Develop Advanced Semiconductor Materials

2/20/2014 – Inpria Corporation receives $4.7M of a committed $7.3M financing. Download the release (PDF)

We're growing!
Read the latest news and view our job openings.
2001 NW Monroe Avenue, Suite 203, Corvallis, OR 97330
Press • News • Jobs • Email
Recent News
Inpria raises another $1.5 million for new semiconductor production technology

6/19/2014 - Article in the Oregonian

Corvallis semiconductor materials startup Inpria raises $7.3 million from Samsung, Intel

2/20/2014 - Article in the Oregonian

Why Intel, Applied Materials are banking on a Corvallis startup

2/20/2014 - Article in the Portland Business Journal.

We're growing! View our job openings.
2001 NW Monroe Avenue, Suite 203, Corvallis, OR 97330
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Job Openings
Staff Research Chemist
  • Ph.D. in chemistry, demonstrated experience with organometallic synthesis
  • Download the PDF
We're growing! Read the latest news.
2001 NW Monroe Avenue, Suite 203, Corvallis, OR 97330